Semiconductor Ceramic Materials – High-Purity Solid SiC, SiN, AlN& Alumina for Plasma & Thermal Environments

Core Introduction

SemiXLab supplies high-performance semiconductor ceramics and related components engineered for extreme plasma etch and high-temperature process environments. The product line covers SiC Ceramics (CVD solid silicon carbide), Quartz Parts, Alumina Ceramics, and Silicon Parts.

Materials are strictly controlled for purity (5N–7N grade) with machining tolerances down to ±0.005 mm, ensuring dimensional stability and low contamination inside critical process chambers. Whether for etch focus rings, chamber liners, wafer support arms, or electrostatic chuck-related components, we deliver long lifetime, low particle generation, and stable process performance.

Among these, CVD solid SiC—with its near-zero porosity structure, extreme hardness, and outstanding resistance to fluorine/chlorine-based plasmas—has become the material of choice for advanced-node etch processes.

High-purity CVD solid SiC focus ring for plasma etch chambers

Key Specifications

Parameter	SiC Ceramics (CVD Solid)	Quartz Parts	Alumina Ceramics	Silicon Parts
Density (g/cm³)	3.10 – 3.21	≈ 2.20	3.90 – 3.98	2.33
Hardness	HV 2300–3000 (Mohs ≈9.5)	Mohs ≈7 (HV 800–1000)	HV 1400–1800 (Mohs 9)	Mohs ≈6.5–7
Thermal Cond. (W/m·K)	150 – 200+	≈ 1.4	25 – 35	≈ 150
Plasma Resistance (F/Cl)	Excellent (baseline 1×)	Fair – Poor	Good	Moderate
CTE (×10⁻⁶/K)	4.0 – 4.5	≈ 0.55	7 – 8	≈ 2.6
Max Service Temp.	≈ 1600°C	≈ 1100°C (softening)	1600 – 1700°C	Process-limited
Typical Lifetime (RF hrs)	500 – 2000+	50 – 200	1500 – 4000	100 – 400
Particle Risk	Extremely low	Higher	Low – Medium	Medium
Key Advantages	Ultimate plasma resistance + high thermal cond. + long life	High purity, low CTE, optical transparency	Excellent insulation, cost-effective	CTE match to wafer, no metal contamination
Typical Applications	Focus rings, chamber liners, high-power etch parts	Viewports, furnace tubes, mild plasma	Insulators, general liners, support parts	Legacy focus rings, electrodes

Application Scenarios

High-power plasma etch focus / edge rings → Prefer SiC Ceramics (especially CVD solid SiC)
Optical viewports, diffusion furnace tubes, mild-environment parts → Quartz Parts
Insulating supports, general chamber liners, cost-sensitive applications → Alumina Ceramics
Legacy processes or strict wafer CTE matching → Silicon Parts