CVD SiC Coated Graphite Parts Professional Cleaning Service

In GaN, AlN, and AlGaN epitaxy processes, CVD SiC-coated graphite components (such as susceptors) accumulate AlN and related process residues after prolonged exposure to high temperatures and reactive atmospheres. Even after 1300°C thermal cleaning, these residues are often difficult to remove completely. The residual layers can trigger memory effects, disrupt gas-flow stability in the reactor, and ultimately impact wafer yield and equipment uptime.

Semixlab provides professional cleaning services for CVD SiC-coated graphite parts. Typical applications include 6-inch and 8-inch CVD SiC-coated graphite parts used in Aixtron, Veeco, and similar MOCVD systems. Customers only need to provide part information and acceptance criteria to initiate evaluation and cleaning.

Key Features

• Effective AlN Residue Removal: Targeted removal of white process residues that thermal cleaning cannot fully eliminate, reducing memory-effect risk.

• Zero Coating Loss Protection: Pre- and post-cleaning thickness comparison confirms that the ~100 µm CVD SiC coating shows no significant reduction (typical range 98–102 µm).

• Low Contamination & High Cleanliness: Control of Fe, Cu, Ni and other metallic impurities, combined with QIII particle and cleanliness inspection, minimizes particle-related impact on gas flow.

• Geometric Accuracy Maintained: Flatness and dimensional checks confirm no physical deformation of the part.

• Customizable Testing & COA: XPS (Al/Ga residual), ICP-MS, thickness comparison and other data can be provided according to customer requirements and included in a Certificate of Analysis.

Before & After Cleaning

Professional Inspection During the Cleaning Process

Figure 1: Surface condition inspection and evaluation during the cleaning process

Surface Condition After Cleaning

Figure 2: CVD SiC-coated graphite part after Semixlab cleaning (clean surface, intact coating)

Note: Original white AlN/AlGaN process residues have been fully removed and the SiC coating remains intact. Actual results are subject to customer acceptance criteria. More details are available in the related case study.

Core Acceptance Criteria (Customizable)

Why Semixlab?

We specialize in thermal-field materials and coating services for compound semiconductors. We understand the real challenge of cleaning in epitaxy processes—it is not simply about removing residue, but about restoring cleanliness while protecting the coating, controlling contamination, and maintaining geometric accuracy. Customers do not need to provide chemical recipes. The Semixlab team develops a tailored process based on part condition and process background, delivering a complete closed loop from evaluation and cleaning to COA delivery.

Related Product: Semixlab CVD SiC Single Wafer Susceptor

Custom Services: Semixlab CVD Coating & Semiconductor Materials Customization

Service Process

1. Requirement Discussion: Send part photos, model, quantity, and acceptance requirements

2. Proposal & Quotation: Evaluate part condition and provide cleaning plan with quotation

3. Part Shipment: Customer ships the parts or we arrange pickup

4. Professional Cleaning: Execute cleaning and agreed inspection items

5. Report Delivery: Provide inspection results / COA and return the parts

6. After-sales Support: Technical support based on subsequent performance in use

Applications & Use Cases

• GaN / AlN / AlGaN epitaxy processes

• CVD SiC-coated graphite parts (susceptors, trays, etc.) used in Aixtron, Veeco and similar MOCVD systems

• Scenarios requiring extended part lifetime, reduced process variation caused by contamination, or verification of recoverability before recoating or replacement