MOCVD Wafer Carrier

Product Overview

Semixlab offers two complementary material platforms:

• Solid SiC Carriers: Fully dense, high-purity silicon carbide produced by advanced CVD or sintering routes. Ideal for the most demanding high-temperature and high-purity processes where zero graphite outgassing is required.

• CVD SiC Coated Graphite Susceptors: High-density isostatic graphite substrate protected by a dense, uniform CVD silicon carbide coating (typically 50–150 µm). Combines excellent thermal conductivity of graphite with superior corrosion and particle resistance of SiC.

Both platforms are manufactured under strict clean-room and purity control, with CNC precision machining down to ±3 µm tolerance, supporting mainstream MOCVD platforms, and custom planetary or single-wafer reactors.

Key Features & Technical Advantages

• Exceptional Temperature Uniformity: Thermal conductivity up to 300 W·m⁻¹·K⁻¹ (CVD SiC) and optimized emissivity ensure wafer surface temperature variation typically < ±1 °C, critical for thickness and composition control.

• Ultra-High Purity & Low Particle Generation: Metal impurities controlled to < 1 ppm (ICP-MS); ash content ≤ 5 ppm. Dense SiC surface minimizes particle adhesion and gas-phase contamination that cause memory effects or yield loss.

• Superior Chemical & Thermal Stability: Resistant to H₂, NH₃, HCl, Cl₂ and high-temperature process gases. Operating temperature capability up to 1600–1800 °C depending on configuration.

• Precision Geometry & Surface Finish: Five-axis CNC machining achieves flatness, concentricity and pocket depth control essential for multi-wafer planetary systems. Optional polished surface Ra ≤ 0.2–0.5 µm.

• Long Service Life & Recoating Support: Dense coating integrity and low residual stress extend usable cycles. Semixlab also provides professional cleaning and recoating services to maximize total cost of ownership.

• Full Customization: Pocket layouts, satellite/planet designs, single-wafer or multi-wafer formats (2"–12"), edge rings, and thermal-field matching available on request.

Typical Material Properties

Note: Exact values depend on grade, coating thickness and process route. Custom datasheets available upon request.

Why Semixlab – Manufacturing + Trading Integration

Semixlab is a vertically integrated supplier of advanced thermal-field materials and coatings for compound semiconductors. Unlike pure traders or pure factories, we control both process development and production capacity:

• In-house CVD equipment & process know-how: Proprietary vertical CVD reactors and coating recipes deliver dense, low-stress SiC layers with excellent uniformity and adhesion.

• Precision machining capability: Dedicated diamond tooling and five-axis CNC for Solid SiC and coated graphite, achieving tight geometric tolerances and low residual stress.

• Closed-loop quality control: Incoming material purity, coating thickness mapping, residual stress, particle and metallic impurity inspection, plus full traceability.

• Application engineering support: We match carrier design to your reactor thermal profile, gas-flow pattern and process chemistry — not just supply a standard part.

• Complementary services: Professional cleaning (AlN residue removal & memory-effect control), recoating, and lifetime extension programs reduce your total cost of ownership.

Manufacturing Excellence – Stress Control & Yield

For Solid SiC annular and disk carriers, residual thermal stress has historically caused cracking during diamond grinding (open-roughing yield often < 20 %). Semixlab solved this by:

1. Switching from conventional horizontal CVD furnaces to high-symmetry vertical CVD reactors optimized by CAE thermal/flow simulation.

2. Implementing staged high-temperature annealing to relieve residual stress (> 70 % reduction).

3. Result: open-roughing yield improved from < 20 % to > 95 %, enabling stable volume supply of crack-free Solid SiC carriers for 12-inch and advanced nodes.

This vertical-furnace + stress-management capability is a core differentiator for customers who require reliable Solid SiC wafer carriers and focus rings.

Get Started

Need high-performance MOCVD wafer carriers with proven temperature uniformity, low particle generation and stable supply? Contact Semixlab today for samples, technical datasheets or a customized quotation.

Website: https://www.semixlab.com

Email / Technical inquiry: Available via website contact form or sales team

Related services: CVD SiC Coated Graphite Parts Professional Cleaning (AlN residue removal & memory-effect control) | Solid SiC Focus Rings & Edge Rings for Dry Etch

Applications & Use Cases

• GaN / AlGaN / AlN MOCVD epitaxy for power devices, RF, and UV-LED

• SiC and silicon epitaxy processes

• LED (blue, green, UV, deep-UV) epitaxial growth

• Planetary, vertical, and single-wafer MOCVD reactors (Aixtron, Veeco, LPE, Nuflare, ASM, TEL compatible designs)

• High-temperature diffusion, oxidation and annealing carriers where chemical inertness is required